December 1,2011, Printed Electronics USA 2011, Santa Clara, CA—Warren Jackson from HP talked about fabricating large area metal oxide thin film transistors (MOTFT) using roll-to-roll imprint lithography. These developments can be applied to many areas including displays, packaging, and civil and military functions. MOTFTs offer many advantages over amorphous silicon and poly-silicon. A-Si has low [...]

 November 16, 2010, Santa Clara, CA—SFBA Nanotechnology Council held a symposium on “Nanoelectronics: Innovation and Implementation” at the National Semiconductor conference center. Chris Bencher, distinguished technical staff at Applied Materials talked about “Process and Integration-Based Scaling for 15 nm Nodes” in the opening session. First, he reviewed the progression of technologies for lithography. In the [...]