EUV and NanoImprint at Advanced Lithography 2015
February 2015 – The SPIE Advanced Lithography conference in San Jose featured 7 technical track conferences in one venue. The primary focus was on two tracks: (1) the highly anticipated arrival of EUV [Extreme Ultraviolet] lithography [Conference 9422] and (2) Alternative Lithography Technologies [Conference 9423]. The EUV track has 14 sections covering viability and need…


